http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100911474-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0049cd0840c201fda92044874314131d |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N1-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-25 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32935 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-3504 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N1-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-25 |
| filingDate | 2008-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2009-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_42bbcdfa982d8fbf243af036941d29e6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fe19f5f57903cd0713eb9d9b6ea07cb4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a445f66bf1102a9ff89cd79b6ebc0045 |
| publicationDate | 2009-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100911474-B1 |
| titleOfInvention | Treatment chamber of gas analyzer using plasma |
| abstract | The present invention relates to a processing chamber of a gas analyzing apparatus using plasma, and the processing chamber of a gas analyzing apparatus using plasma according to the present invention is a processing chamber of a gas analyzing apparatus which generates a plasma therein by introducing a process gas exhausted from a process chamber. In the process chamber, one end is blocked and the other end is formed in the form of a stepped opening, the optical signal portion insertion groove is integrally formed at one end in the other end direction.n n n According to the present invention, by processing in one end of the processing chamber receiving the optical signal in the form of a groove, a protrusion or a detachable form, natural cleaning is performed by the residual gas together with preventing and suppressing the deposition of by-products, while increasing the amount of incident of the optical signal. Forming a space therein minimizes the refraction of the optical signal, and has the effect of reducing the deposition amount of the contaminants by minimizing the area of the deposition site of the contaminants. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102140711-B1 |
| priorityDate | 2008-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.