http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100908777-B1

Outgoing Links

Predicate Object
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S414-139
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S414-14
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-22
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-22
filingDate 2006-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2009-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2009-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100908777-B1
titleOfInvention Vertical batch processing unit and semiconductor processing system
abstract The vertical batch processing apparatus is configured to convert the semiconductor oxide film into an intermediate film which is more easily decomposed or sublimated than the semiconductor oxide film in order to remove the semiconductor oxide films on the plurality of workpieces. The apparatus includes a first processing gas supply system for supplying a first processing gas to the processing region from a first supply port disposed outside the processing region, and a second disposed between the first supply port and the processing region. And a second processing gas supply system for supplying a second processing gas to the processing region from a supply port. Between the first supply port and the second supply port, a plasma generation region for generating a first active species by exciting the first processing gas is disposed. The reaction of the first active species with the second processing gas produces a reactant that reacts with the semiconductor oxide film to form the intermediate film. n n Oxide film, gas supply system, process gas, plasma generating region, intermediate film
priorityDate 2005-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002100574-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003059899-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458392451
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559581
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID297
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID25516
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID450502002

Total number of triples: 23.