http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100904576-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-133526 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2006-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2009-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2009-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100904576-B1 |
| titleOfInvention | Photosensitive dry film and photosensitive resin composition for manufacturing three-dimensional micro molding |
| abstract | The actinic radiation exposure amount (mJ / cm 2 ) is x, and the resin curing amount by the exposure amount is the ratio y (= Δh / h) of the residual film thickness Δh (μm) after development to the coating film thickness h (μm) before development. When the relation y = αLn (x) ± β (β is any real number) between x and y is obtained, the photosensitive resin composition for producing a three-dimensional micro-molded article having a high sensitivity of 0.35 ≦ α ≦ 0.78, and photosensitive using the same Provide dry film. As a result, the molding precision of the three-dimensional micro molded body having a predetermined three-dimensional surface can be improved.n n n n 3D micro molding, photosensitive resin, dry film, high sensitivity, molding precision |
| priorityDate | 2005-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 267.