http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100897028-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05B33-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05B33-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05B33-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-233 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K59-35 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-10 |
| filingDate | 2003-01-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2009-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2009-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100897028-B1 |
| titleOfInvention | Manufacturing method of electroluminescent element |
| abstract | When forming a light emitting part using the photolithography method, this invention avoids the state which the extra layer is laminated | stacked on each light emitting part formed in a pattern form, and in the peeling process of the said extra layer, It aims at providing the manufacturing method of the EL element which can perform peeling process easily and quickly.n n n In order to achieve the above object, the present invention is directed to a method of manufacturing an EL element using a photolithography method, wherein the light emitting portion of at least one color having a photoresist layer is formed on a surface of the EL element. Applying a coating solution for forming a dichroic light emitting layer to form a color to form a dichroic light emitting layer, applying a photoresist to the dichroic light emitting layer to form a photoresist layer for a dichroic light emitting layer, and the photoresist layer for a dichroic light emitting layer. Pattern exposure and development to pattern the photoresist layer for dichroic light emitting layer in the portion where the dichroic light emitting part is formed, and to remove the dichroic light emitting layer in the part where the photoresist layer for dichroic light emitting layer is removed, thereby removing the photoresist for dichroic light emitting layer. Comprising a step of forming a patterned dichroic light emitting part having a layer on the surface thereof Provided is a method of manufacturing an EL element, characterized by the above-mentioned.n n n n Photoresist layer, photolithography method, dichroic light emitting layer |
| priorityDate | 2002-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 84.