http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100894101-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76232 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-76 |
| filingDate | 2007-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2009-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2009-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100894101-B1 |
| titleOfInvention | Device Separating Method of Semiconductor Device |
| abstract | A device isolation film forming method of a semiconductor device of the present invention includes forming a trench in a semiconductor substrate; Forming a liner layer on the exposed side of the trench; Forming a flowable insulating film filling the trench; Recessing the flowable insulating film; Forming a buffer film on the liner film of the trench sidewalls exposed by the recess; Performing etching on the buffer film to mitigate the rough surface of the liner film caused during the recess process; And depositing a trench in which the rough portion of the liner film surface is relaxed to the buried insulating film.n n n n Surface uniformity, fluid insulating film, buffer film |
| priorityDate | 2007-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 29.