http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100891941-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L101-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2001-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2009-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2009-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100891941-B1 |
| titleOfInvention | Photoresist Compositions and Their Uses |
| abstract | The compositions and methods of the present invention are provided for controlling the flow of resist into the device contact (pass) hole during the post-exposure development hard-bake step. The resists of the present invention are positive-functional and are exposed to 1) during soft-baking pre-exposure heat treatment to remove solvent carriers of the applied resist, and 2) to promote or enhance acid-generating reactions in the exposed areas. It contains one or more components that are more substantially stable (ie substantially free of crosslinking) during the post-development heat treatment (typically a de-blocking reaction). However, the resist of the present invention will crosslink during the more stringent heat treatment (heat flow hard-baking step) after development. |
| priorityDate | 2000-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 97.