http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100882289-B1

Outgoing Links

Predicate Object
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82B3-00
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28
filingDate 2004-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2009-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2009-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100882289-B1
titleOfInvention Semiconductor device and manufacturing method thereof
abstract A plurality of starting point patterns 3 containing a catalyst metal are formed above the semiconductor substrate 1. Next, the insulating film 4 covering the starting point pattern 3 is formed. Next, the groove | channel in which the side surface of the origin pattern 3 is exposed is formed in the insulating film 4 from both ends. Thereafter, the wiring is formed by growing the carbon nanotubes 5 having conductive chirality in the grooves. Thereafter, an interlayer insulating film covering the carbon nanotubes 5 is formed. n n Starting pattern, chirality, carbon nanotube, field effect transistor
priorityDate 2007-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002329723-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004241572-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID297
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559581

Total number of triples: 17.