Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a492183be65153abfa7dec00d51c816 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0332 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate |
2007-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2008-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0b0a2ee9ff763e30f4c25f9f7d84843a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_09bb2705681468549846a402a5d94fdd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_786b3b0e4077a2eea8fa39e7ebb45d51 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7a3a3ff9f99104dd66d5f13c1c1360da |
publicationDate |
2008-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-100875661-B1 |
titleOfInvention |
Semiconductor device manufacturing method |
abstract |
The present invention is to provide a semiconductor device manufacturing method for increasing the pattern uniformity of the etched layer by preventing the deformation of the amorphous carbon film in the etching process using an amorphous carbon film as a hard mask film, for this purpose Forming an amorphous carbon film, doping carbon ions into the amorphous carbon film, patterning the amorphous carbon film, and etching the etched layer using the patterned amorphous carbon film as an etch barrier. The deformation of the mask layer, that is, the amorphous carbon layer, is prevented and thereby the pattern uniformity of the etching target layer is improved. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113078043-A |
priorityDate |
2007-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |