| abstract |
The present invention is a novel chemically amplified photoresist material having excellent transparency, improved dry etching resistance, and a F 2 laser, wherein a fluorine-containing ketone portion or a fluorine-containing tertiary alcohol portion is directly bonded to a norbornene skeleton. Provided are a normplene derivative, a fluorine-containing polymer obtained by using it as a copolymerization monomer, a chemically amplified photoresist composition containing the fluorine-containing polymer, a photoacid generator and a solvent.n n n Fluorine-containing ketone structures, fluorine-containing norbornene derivatives, fluorine-containing alcohol structures, fluoroalkylating agents, protective acid reactive functional groups, fluorine-containing polymers, chemically amplified photoresist compositions |