http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100864263-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L25-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate | 2002-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2008-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2008-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100864263-B1 |
| titleOfInvention | Positive resist composition and pattern formation method for heat flow |
| abstract | In the manufacture of a semiconductor device, a resist material which exhibits sufficient resolution even in normal pattern formation and can have a small pattern dimension only by an appropriate flow bake temperature, has a suitable flow rate, and has a rectangular profile with easy flow rate control to provide.n n n (a) An acid-decomposable resin which has increased solubility in an alkaline developer due to the action of an acid and (b) a photoacid generator, wherein the resin of (a) has the following glass transition points before and after acid decomposition. It consists of resin A and resin B which satisfy | fill the characteristic to display, It is a positive resist composition characterized by the above-mentioned.n n n Before acid decomposition: Glass transition point of Resin A> Glass transition point of Resin Bn n n After acid decomposition: glass transition point of resin A <glass transition point of resin B |
| priorityDate | 2001-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 206.