http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100864147-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D06C23-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D06N7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B62D1-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D06M13-005 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-492 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2005-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2008-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2008-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100864147-B1 |
| titleOfInvention | Positive resist material and pattern formation method |
| abstract | The present invention has high sensitivity and high resolution, has low line edge roughness, and is preferable as a fine pattern forming material for producing ultra LSI,n n n Positive containing the high molecular compound which makes unit A which has an ester group of an exo body represented by general formula (1a), and a unit B which has an ester group which has two hexafluoroisopropanol groups represented by general formula (1b) as a structural unit It provides a type resist material.n n n n n n n n n Wherein R 1 and R 2 are H, CH 3 or CH 2 CO 2 R 14 , R 3 is an alkyl group, an aryl group, and R 4 to R 9 , R 12 and R 13 are H or a monovalent hydrocarbon group. R 10 and R 11 may form H, or a ring may form a double bond, R 14 is H or an alkyl group, R 15 is H or CH 3 , and R 16 and R 17 are H or an acid labile It is regular and the said general formula (1a) also shows an enantiomer.n n n n Positive resist material, exo body, hexafluoroisopropanol group, adhesive group, photomask group |
| priorityDate | 2004-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 664.