http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100859154-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate | 2003-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2008-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2008-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100859154-B1 |
| titleOfInvention | High Tensile Photosensitive Resin Composition |
| abstract | The present invention relates to an alkali developing negative photosensitive resin composition, comprising an alkali soluble binder polymer, a photopolymerizable monomer, a photopolymerization initiator, and an additive, but having a (meth) acrylate group at the molecular end as a photopolymerizable monomer and having an intermediate chain. Silver is a composition containing a compound which is a block copolymer of ethylene oxide and propylene oxide, which can realize high tentability while having the same resolution and fine wire adhesion as compared to the conventional bisphenol compound, and thus, dry film photoresist having high tentability is used. Can provide. |
| priorityDate | 2003-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 114.