http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100857967-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31663 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate | 2004-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2008-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2008-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100857967-B1 |
| titleOfInvention | Anti-reflection film material, anti-reflection film and pattern formation method using the same |
| abstract | The present invention provides a material of an antireflection film having a high etching selectivity with respect to a resist, that is, a high etching rate with respect to a resist, and a pattern formation method for forming an antireflection film layer on a substrate using the antireflection film material, and the reflection There is also provided a pattern formation method using the prevention film as a hard mask for substrate processing.n n n The present invention provides a reflection containing (A) a polymer compound having a repeating unit by copolymerization represented by the following general formula (1) and / or the following general formula (2), (B) an organic solvent, (C) an acid generator, and (D) a crosslinking agent. Providing a protective film material.n n n <Formula 1>n n n n n n n n <Formula 2>n n n n n n n n n Anti-reflection film material, pattern formation method, hard mask |
| priorityDate | 2003-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.