http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100854455-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B28D5-0076 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 2006-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2008-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2008-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100854455-B1 |
| titleOfInvention | Watermark removal method of semiconductor device |
| abstract | In the watermark removing method of the semiconductor device of the present invention, an air molecular contaminant (AMC) adsorbed to a pattern including a silicon rich oxynitride (SRON) film formed on a substrate is cleaned by performing a rapid heat treatment process. Removen n n n SRON membrane, atmospheric molecular pollutant, watermark, heat treatment |
| priorityDate | 2006-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 23.