http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100854441-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2d825814c2847d297de844b4e7c60de4 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02123 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2855 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02491 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02532 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-203 |
| filingDate | 2008-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2008-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_86820e56777de2b4af20a0e55d0dfa91 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd27a5e2a4996c378b8b9e4e86506730 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b665a6ab6bfba1b8f2b7a8e192f8196b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37d52c4a4d9cbe2d45385d4cd055c897 |
| publicationDate | 2008-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100854441-B1 |
| titleOfInvention | Substrate having a moisture barrier film comprising a metal thin film and a silicon-based compound and a method of manufacturing the same |
| abstract | The present invention relates to a substrate having a moisture barrier film and a method for manufacturing the same, having fine pores not formed and having excellent moisture barrier performance.n n n Substrate with a moisture barrier film according to the present invention, a metal thin film 142 deposited by physical vapor deposition (PVD) on one surface of the transparent base material 120 made of a polymer, and silicon-based formed through plasma polymerization (Plasma polymerization) Compound 144. In addition, the method of manufacturing a substrate with a moisture barrier film according to the present invention, the pre-treatment step (S100) for pre-processing the surface of the transparent base material 120 made of a polymer using an ion beam; A thin film forming process (S220) of forming a metal thin film on the base material by sputtering or thermal evaporation, and a compound forming process of forming a silicon-based compound on the upper surface of the metal thin film by plasma polymerization. Characterized in that consisting of; (S240); moisture barrier film forming step (S200) including.n n n According to the present invention configured as described above, there is an advantage that the water vapor transmission rate and oxygen permeability are greatly reduced while maintaining transparency. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100974171-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101105226-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101109407-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100965847-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021047723-A1 |
| priorityDate | 2008-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 46.