http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100851753-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1146d1dc4ffd66d77c25805ca3f9a74f |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14627 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-146 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14685 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-146 |
| filingDate | 2007-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2008-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5a668a853a63ed1a4115f28d055600f8 |
| publicationDate | 2008-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100851753-B1 |
| titleOfInvention | Manufacturing Method of Image Sensor |
| abstract | In another embodiment, a method of manufacturing an image sensor includes forming a protective layer on a substrate; Forming a color filter layer on the protective layer; Forming an oxide film on the color filter layer; Forming a first photoresist pattern on the oxide film; Plasma-processing the oxide film using the first photoresist pattern as a mask; And removing the first photoresist layer pattern and isotropically etching the plasma-treated oxide layer to form an oxide layer microlens. |
| priorityDate | 2007-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 17.