http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100843804-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-107 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-128 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-0025 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F14-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C1-73 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F214-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D145-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-387 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C1-675 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F14-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-675 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-73 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F214-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-00 |
| filingDate | 2004-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2008-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2008-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100843804-B1 |
| titleOfInvention | Negative resist composition with fluorosulfonamide-containing polymer |
| abstract | The present invention discloses a negative resist composition comprising a polymer comprising at least one fluorosulfonamide monomer unit having one of the following two formulas.n n n n n n n n Wherein M is a polymerizable backbone moiety; Z is a linking moiety selected from the group consisting of -C (O) O-, -C (O)-, -OC (O)-, -OC (O) -C (O) -O-, or alkyl; P is 0 or 1; R 1 is a linear or branched alkyl group having 1 to 20 carbon atoms; R 2 is hydrogen, fluorine, a linear or branched alkyl group of 1 to 6 carbon atoms, or a semi or fluorinated or perfluorinated linear or branched alkyl group of 1 to 6 carbon atoms; n is an integer of 1-6. The invention also includes applying a fluorosulfonamide-containing resist composition to a substrate to form a resist layer on the material layer; Exposing the resist layer to the patterned radiation patternwise; Removing portions of the resist layer not exposed to the imaging radiation to create a space in the resist layer corresponding to the pattern; Also disclosed is a method of forming a patterned material layer on a substrate, comprising removing a portion of the material layer in a space formed in the resist layer to form a patterned material layer.n n n Negative Resist Compositions, Fluorosulfonamide-Containing Polymers |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101454981-B1 |
| priorityDate | 2003-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 75.