http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100834492-B1

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
filingDate 2007-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2008-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dc2d41e213817a8cd2868664c20816c4
publicationDate 2008-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100834492-B1
titleOfInvention Semiconductor Reaction Byproduct Trap Device
abstract It actively blocks the reaction by-products generated in the process chamber from being sucked into the vacuum pump during deposition and etching of the thin film, and secures the maximum effective area where the reaction by-products can be actually collected. Disclosed is an improved reaction byproduct trap device for semiconductors that can be easily removed for the collected reaction byproducts. The trap device includes a hollow trap housing. The multiple trap plates are arranged horizontally and parallel to each other inside the trap housing. The heater is disposed perpendicular to the trap housing through the trap plates to heat the trap plates. The mesh structure is disposed at least one or more in plate shape between the trap plates. At least one or more flow holes are formed in the mesh structure.
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Total number of triples: 32.