| abstract |
The present invention relates to an etching composition capable of simultaneously etching a gold / titanium thin film without affecting a substrate layer such as a PMMA panel and an etching method using the same, comprising: a) 20 to 55 wt% of hydrochloric acid, b) 5 to 5 nitric acid It provides a composition for etching gold / titanium thin film comprising 25% by weight, c) 0.1 to 15% by weight of fluoride, d) 1 to 20% by weight of chloric acid, and e) remaining water and an etching method using the same. |