| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32134 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-1884
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-14 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-00 |
| filingDate |
2001-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2008-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2008-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-100821884-B1 |
| titleOfInvention |
Etching Liquid Composition |
| abstract |
The present invention provides an etching solution for a transparent conductive film, in which foamability is suppressed and no residue after etching is selected. It is characterized in that the etching liquid combination containing one or two or more compounds. |
| priorityDate |
2000-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |