http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100812834-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2329-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J3-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2201-3165 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A63H33-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A63H33-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J9-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J11-46 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J1-30 |
| filingDate | 2006-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2008-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2008-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100812834-B1 |
| titleOfInvention | Method of Forming Film and Manufacturing Method of Electronic Source Substrate |
| abstract | In the case where a film is formed at a plurality of positions by using an inkjet head having a plurality of nozzles, for example, the misalignment of the drop placement position due to the distortion of the substrate can be efficiently corrected, whereby the electron source with high yield is obtained. To prepare.n n n The position of the element electrodes 2 and 3 on the electron source substrate 1 is detected in advance by inserting the surface image of the substrate 1, and then the position at which the conductive film 4 is formed is calculated as the droplet dropping position. Then, the inclination angle θ of the inkjet head 11 is adjusted so that the pitch d of the liquid drop applying position and the pitch of the nozzle 12 coincide with each other. |
| priorityDate | 2005-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 32.