| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-135
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24355
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24157
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-249994 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K59-122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05B33-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-201
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-611
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K59-173
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-223 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-56 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G09F9-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1335
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-05
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B29-64
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-22 |
| filingDate |
1999-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2008-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2008-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-100799962-B1 |
| titleOfInvention |
Thin film formation method, display device and color filter |
| abstract |
The method for forming a thin film according to the present invention is a process of forming an affinity bank layer 111-11n with a material (an inorganic material such as SiO 2) showing affinity for the thin film material solution 130 and an affinity for the thin film material solution. The affinity bank layer and the non-affinity bank layer are alternately stacked one or more times to form the bank 110 by repeating the process of forming the non-affinity bank layer 121-12n with a material (such as a resist) that exhibits. . Finally, the thin film material solution 130 is filled between the banks by an inkjet method, and the thin film layers 131 to 13n are laminated in order by heating. By this process, the cost required for affinity control can be reduced, and it is possible to form a multilayer thin film having a uniform film thickness.n n n n Thin film, bank, affinity |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11204518-B2 |
| priorityDate |
1998-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |