http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100799943-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D333-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D333-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2001-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2008-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2008-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100799943-B1 |
| titleOfInvention | Positive Resist Compositions and Sulfonium Salts of Chemically Amplified Types |
| abstract | The present invention,n n n (1) at least one onium salt selected from (a) a sulfonium salt represented by formula (1), (b) a triphenylsulfonium salt represented by formula (2a) and a diphenyl iodonium salt represented by formula (2b) An acid generator, andn n n (2) A resin having a polymerized unit having an acid labile group, which is itself insoluble or poorly soluble in alkali, but soluble in alkali by the action of acid.n n n It provides a resist pattern containing and improved line edge roughness, and provides a chemically amplified positive resist composition excellent in a variety of resist performance, such as dry etching resistance, sensitivity and resolution.n n n n n n n n n n In formula, Q < 1> and Q < 2> represent a C1-C6 linear or branched alkyl group, or a C3-C10 cycloalkyl group each independently, or Q < 1> and Q < 2> adjoin together with the sulfur atom adjacent to oxygen An aliphatic heterocyclic group which may further contain atoms and sulfur atoms; Q 3 represents a hydrogen atom, Q 4 represents a linear or branched alkyl group having 1 to 6 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, or a CHC (O) group in which Q 3 and Q 4 are adjacent to each other; Together form a 2-oxocycloalkyl group, Q 5 SO 3 - represents an organic sulfonate ion, provided that when Q 5 represents a perfluoroalkyl group having 1 to 8 carbon atoms, Q 1 is a straight chain having 1 to 6 carbon atoms or A branched alkyl group, Q 2 represents a linear or branched alkyl group having 1 to 6 carbon atoms or a cycloalkyl group having 3 to 10 carbon atoms, and Q 3 and Q 4 are 2-oxocyclo together with the adjacent CHC (O) group. The case where an alkyl group is represented is excluded.n n n n n n n n n n n n n n n n n Wherein, P 1 ~P 5 are each independently hydrogen, a hydroxyl group and represents an alkyl group or an alkoxy group having 1 to 6 carbon atoms having 1 to 6 carbon atoms, P 6 SO 3 - and P 7 SO 3 - each independently is an organic Sulfonate ions. |
| priorityDate | 2000-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.