http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100788806-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2000-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2007-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100788806-B1 |
| titleOfInvention | Positive photoresist composition |
| abstract | The present invention provides a highly sensitive positive photoresist composition in the manufacture of semiconductor devices.n n n The present invention contains (A) a repeating unit represented by the following general formula (I) and a repeating unit represented by at least one of the following general formulas (IIa) and (IIb), and solubility in an alkaline developer by the action of an acid. A positive photoresist containing at least one of a resin having an increased content thereof, (B) a compound which generates an acid by irradiation with actinic light or radiation, and (C) a fluorine-based and / or silicon-based surfactant and a nonionic surfactant. Consists of a composition. |
| priorityDate | 1999-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 431.