http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100776154-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3a17dc10b5bd6e5f0df2ce1aab3bbdce |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14698 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14685 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1462 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-146 |
| filingDate | 2006-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_321ea8a9b274105ff80a48fcee6275a4 |
| publicationDate | 2007-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100776154-B1 |
| titleOfInvention | Manufacturing Method of Semiconductor Device |
| abstract | The present invention relates to a method of manufacturing a semiconductor device that can easily remove defects and improve the characteristics of the device by changing the sinter process conditions in the semiconductor device.n n n A method of manufacturing a semiconductor device according to the present invention includes the steps of forming a transistor region on a semiconductor substrate; Forming a protective film on the semiconductor substrate; Forming a nitride film on the protective film; The nitride substrate is formed on the semiconductor substrate comprises the step of annealing at 1 ~ 10 torr pressure, 250 ~ 450 ℃ temperature conditions.n n n As a result, the present invention is capable of performing a sinter process within a short time by forming a protective film in a semiconductor device and then performing heat treatment at low pressure using hydrogen gas or deuterium gas, and also has an effect of improving device characteristics. |
| priorityDate | 2006-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.