http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100773045-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2002-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2007-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100773045-B1 |
| titleOfInvention | Positive resist composition |
| abstract | Positive resist containing (A) alicyclic cyclic hydrocarbon group, the specific resin which the dissolution rate in alkaline developing solution increases by the action of an acid, and (B) the specific compound which generate | occur | produces an acid by actinic light or irradiation. To provide a composition.n n n This composition is excellent in resolution and exposure margin and can be preferably used for micro photofabrication using far ultraviolet rays, especially ArF excimer laser light. |
| priorityDate | 2001-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 366.