http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100768863-B1
Outgoing Links
Predicate | Object |
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classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D233-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D403-04 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D403-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D233-88 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D233-54 |
filingDate | 2003-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2007-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2007-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-100768863-B1 |
titleOfInvention | Hexaarylbiimidazole compounds and photoinitiator compositions containing them |
abstract | The present invention provides novel hexaarylbiimidazole compounds of formula (1):n n n n n n n n Here, each R 1 is a halogen atom, and each R 2 is an alkyl group having 1 to 4 carbon atoms which may have a substituent. The hexaarylbiimidazole compound of the present invention is used as a photoradical generator in the photopolymerizable composition used as a resist, and is characterized in that the thermal decomposition product is low sublimable. The photopolymerizable composition may be suitably used as a color filter used for a resist or a color liquid crystal display element, a camera, or the like. |
priorityDate | 2002-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 361.