Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
filingDate |
2001-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2007-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2007-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-100754335-B1 |
titleOfInvention |
Positive photoresist composition |
abstract |
The present invention contains a resin containing a specific repeating unit, the rate of dissolution in an alkaline developer by the action of acid, andn n n Provided is a positive photoresist composition comprising a compound that generates an acid upon irradiation with actinic radiation or radiation. |
priorityDate |
2000-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |