http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100753064-B1
Outgoing Links
Predicate | Object |
---|---|
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0514 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2201-0195 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J11-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J9-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J1-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-4664 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J9-241 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J17-49 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J1-30 |
filingDate | 2005-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2007-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2007-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-100753064-B1 |
titleOfInvention | Manufacturing Method of Thick Film Dielectric Pattern and Manufacturing Method of Image Display Device |
abstract | In the method for forming a thick film dielectric pattern, a photosensitive dielectric paste layer having a relatively softening point is formed on a substrate, a photosensitive dielectric paste layer having a relatively softening point is formed on the substrate, and these paste layers are exposed and developed to form a precursor pattern. The precursor pattern is collectively fired to form a thick film dielectric pattern having a flat upper surface and side edge portions of an omnidirectional taper shape (outwardly inclined shape).n n n n Photosensitive Dielectric, Precursor, Softening Point, Exposure, Developing, Firing |
priorityDate | 2004-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 24.