http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100753064-B1

Outgoing Links

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classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0514
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2201-0195
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J11-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J9-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J1-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-4664
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J9-241
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J17-49
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J1-30
filingDate 2005-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2007-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2007-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100753064-B1
titleOfInvention Manufacturing Method of Thick Film Dielectric Pattern and Manufacturing Method of Image Display Device
abstract In the method for forming a thick film dielectric pattern, a photosensitive dielectric paste layer having a relatively softening point is formed on a substrate, a photosensitive dielectric paste layer having a relatively softening point is formed on the substrate, and these paste layers are exposed and developed to form a precursor pattern. The precursor pattern is collectively fired to form a thick film dielectric pattern having a flat upper surface and side edge portions of an omnidirectional taper shape (outwardly inclined shape).n n n n Photosensitive Dielectric, Precursor, Softening Point, Exposure, Developing, Firing
priorityDate 2004-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523933

Total number of triples: 24.