http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100752504-B1

Outgoing Links

Predicate Object
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1669
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-168
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-16
filingDate 2004-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2007-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2007-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100752504-B1
titleOfInvention Method for forming metal wiring in pattern using electroless plating
abstract The present invention relates to a method for forming a metal wiring in a pattern using an electroless plating, and to form a thin and uniform seed layer in a copper electroless plating solution using cobalt or formaldehyde as a reducing agent when forming the primary seed layer. And a pattern by bottom-up filling method using dimerethane octasulfonic acid (4,5-dithiaoctane-1,8-disulfonic acid) or mercaptopropanesulfonate (3-mercapto-1-propanesulfonate) as an additive. It comprises a step of filling with a metal, the method of forming a metal wiring in the pattern using the electroless plating according to the present invention to reduce the surface roughness of the metal wiring and improve the film quality, such as voids (seam) There is an effect that can form a bump (bump) by filling the bottom-up filling method without a defect.n n n n Electroless Plating, 4,5-dithiaoctane-1,8-disulfonic acid, 3-mercapto-1-propanesulfonate, SPS, MPSA, void, 씸 ( seam, bottom-up filling, bump
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9365943-B2
priorityDate 2004-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100535977-B1
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID21902451
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415826359
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5352426
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID712
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID1474
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449025518
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415783955
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419524915
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID127427
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID452044797
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415782876
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID447669256
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID447730362
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID411832067
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559368
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3301
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419554224
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID413422671
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23978
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419546721
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6093208
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559357
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID87217
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24643
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425901710
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458391437
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453863204
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID104730
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID87838
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID499661
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID87206
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24014
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID418354341
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID412216749
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID944
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6049
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24821

Total number of triples: 53.