http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100744926-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-0838 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-24 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-42 |
| filingDate | 2001-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2007-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100744926-B1 |
| titleOfInvention | Polysiloxanes, preparation methods thereof, silicon-containing alicyclic compounds, and radiation-sensitive resin compositions |
| abstract | The present invention relates to novel polysiloxanes having structural unit I of formula 1a and / or structural unit II of formula 1b and structural unit III of formula 1c.n n n n n n n n n n n n n n n n n n n n n n n n Wheren n n A 1 and A 2 are monovalent acid dissociable organic groups,n n n R 1 is hydrogen, monovalent (halogenated) hydrocarbon, halogen or amino,n n n R 2 is a monovalent (halogenated) hydrocarbon group or halogen.n n n Also provided is a method for producing the polysiloxane, a silicon-containing alicyclic compound providing the polysiloxane, and a radiation-sensitive resin composition comprising the polysiloxane. The polysiloxane is useful as a resin component for resist materials, effectively responds to radiation having short wavelengths, exhibits high transparency to radiation and excellent dry etching properties, and basic resist properties required for resist materials such as high sensitivity, resolution, and developability. This is excellent.n n n Polysiloxane, production method, silicon-containing alicyclic compound, radiation-sensitive, resin composition |
| priorityDate | 2000-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0410606-A2 |
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457004276 |
Total number of triples: 26.