http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100741295-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A01G9-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05B17-08 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 |
| filingDate | 2005-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2007-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100741295-B1 |
| titleOfInvention | Photosensitive resin composition |
| abstract | The present invention relates to a photosensitive resin composition, and in particular, to a photosensitive resin composition containing an imidazole dimer photoinitiator, a) a triarylmethane-based photosensitizer, and b) a heteroaromatic photosensitizer comprising a thiol functional group. It relates to a photosensitive resin composition comprising a.n n n The photosensitive resin composition according to the present invention can form a pattern having a uniform line width irrespective of the illuminance deviation of the semiconductor laser light source, and is suitable for direct dimming using a semiconductor diode laser in the 350 to 410 nm region, and at the same time, It is possible to develop and is excellent in sensitivity, resolution, adhesion to the substrate, and storage stability.n n n Semiconductor lasers, imidazole dimers, triarylmethanes, thiol functional groups |
| priorityDate | 2005-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 153.