http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100733847-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2001-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2007-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100733847-B1 |
| titleOfInvention | Negative resist composition for electron beam or X-ray |
| abstract | The negative resist composition for electron beam and X-ray of this invention can provide the negative resist composition which is excellent in a sensitivity and a resolution, and has a rectangular profile, even under the conditions of high acceleration voltage.n n n The negative resist composition for an electron beam or X-ray of the present invention is (A) a compound which generates an acid and / or radical species by irradiation with an electron beam or X-ray, (B) a resin insoluble in water and soluble in aqueous alkali solution, (C) It is characterized by containing a crosslinking agent which generates crosslinking with the resin of (B) by the action of an acid, and a compound having one or more unsaturated bonds polymerizable by (D) acid and / or a radical. |
| priorityDate | 2000-01-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 457.