http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100731736-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_717c792fca7cc9c290c9db33e8fe078b http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_30730f371e000ed244df22d6a434dccd |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2012 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate | 2006-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_847ce8ea0f4b82ab923ca5b4896bfa46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_97f6f51a09d6a2e3bb23882eb007d490 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da104de3520ad32250445891a6244061 |
| publicationDate | 2007-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100731736-B1 |
| titleOfInvention | Fine Pattern Forming Method Using Rigid-Flex Mold and Roller |
| abstract | The present invention is to enable the formation of a fine pattern on the substrate through a thin film transfer technique using a ridgeflex mold and roller capable of processing in the form of a film, for the purpose of the present invention, the flexibility and elasticity that can be bent A pair of cylindrical pressure rollers spaced apart by a predetermined interval after aligning the Rigid-Flex mold having the reverse phase pattern corresponding to the fine pattern to be formed on the substrate and the substrate on which the fine pattern material of the polymer is formed to face each other; By applying a rolling thin film transition patterning technique using a pair of cylindrical cooling rollers, it is possible to form a fine pattern of 100 nm or less with a target step on a substrate with high precision, and to effectively apply it to a large area substrate. Also continuous polymer pads using Rigid-Flex mold and roller Turning then maintained by giving as the contact between the ridges and flex the mold and the polymer to the cooling time of the fine pattern, it is possible to reliably prevent the falling of fine patterns formed on the high-temperature process flow. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102244646-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101041498-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102148476-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150069759-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200116694-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3456506-A4 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3988282-A1 |
| priorityDate | 2006-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 37.