http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100722989-B1

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filingDate 2005-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2007-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2007-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100722989-B1
titleOfInvention Capacitor and manufacturing method thereof
abstract The present invention provides a capacitor fabrication method suitable for improving dielectric constant and leakage current characteristics of a capacitor to secure a dielectric capacity. A dielectric film having a crystalline zirconium oxide film and an amorphous aluminum oxide film stacked on the lower electrode; And an upper electrode on the dielectric film. Accordingly, the present invention provides a method of manufacturing a high-k dielectric material by maintaining the crystallinity of a zirconium oxide (ZrO 2 ) as a high-k film material and increasing the dielectric constant by using an amorphous aluminum oxide (Al 2 O 3 ) , The leakage current characteristic is reduced, and the characteristics of the capacitor are improved.n n n n A zirconium oxide film (ZrO2), an aluminum oxide film (Al2O3), a dielectric film, a capacitor
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priorityDate 2005-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 48.