http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100710020-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-125 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-095 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0568 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61H2201-105 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61H2033-068 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-013 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61N2005-066 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61H2201-1607 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-1173 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-1258 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61H35-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61H33-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-135 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61H33-065 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-10 |
| filingDate | 2006-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2007-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100710020-B1 |
| titleOfInvention | Method of forming film pattern and method of manufacturing device, electro-optical device and electronic device |
| abstract | Provided is a method of forming a film pattern capable of forming a film pattern with finer or thinner lines with good quality and uniformity.n n n Forming a first bank B1 having a surface liquefied on the substrate P, arranging the first functional liquid L1 in a region partitioned by the first bank B1, and a first function The process of drying the liquid L1, the process of forming the 2nd bank B2 on the 1st bank B1, and the 2nd functional liquid L2 is arrange | positioned in the area | region partitioned by the 2nd bank B2. To have a process. In this invention, the process of carrying out the lyophilic process of the surface of the 1st bank B1 is provided between the process of arrange | positioning the 1st functional liquid L1, and the process of forming the 2nd bank B2. Thereby, the wettability of the 2nd functional liquid L2 and the 1st bank B1 which is a base is improved, and the favorable 2nd film pattern F2 can be formed.n n n n Film pattern formation method, refinement, thinning, lyophilic treatment, bank. |
| priorityDate | 2005-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 51.