http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100703077-B1

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filingDate 2005-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2007-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2007-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100703077-B1
titleOfInvention Method for manufacturing crystalline dielectric thin film, and crystalline dielectric thin film manufactured thereby and thin film capacitor having same
abstract Provided are a method for producing a crystalline dielectric thin film capable of forming a crystalline dielectric thin film at a low temperature of 300 ° C or lower. A method of manufacturing a crystalline dielectric thin film according to the present invention comprises the steps of forming an amorphous dielectric thin film on a substrate; Crystallizing the dielectric thin film by immersing the amorphous dielectric thin film in water and hydrothermally treating the enclosed space.n n n n Thin Film Capacitors, Dielectric
priorityDate 2005-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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