http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100699655-B1
Outgoing Links
Predicate | Object |
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classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24182 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01P11-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01P3-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01P11-006 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01P3-165 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01P3-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01P11-00 |
filingDate | 2004-01-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2007-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2007-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-100699655-B1 |
titleOfInvention | Dielectric line and manufacturing method |
abstract | Sufficient strength is ensured to provide a dielectric line suitable for mass production and a method of manufacturing the same. A method for manufacturing a dielectric line comprising a dielectric strip having a width narrower than the conductor plate and a dielectric medium made of a porous material having a lower dielectric constant than the dielectric strip between two substantially parallel conductor plates. As a film forming step (S11, S12) of forming a film of a dielectric material on one of said conductor plates, and exposing a shape portion of said dielectric strip in said film of said dielectric material to predetermined light, beam or vapor. A dielectric line (NRD guide) is produced through a strip exposure step (S13) and a porous filmation step (S15, S16) for making the entire film of the dielectric material porous. |
priorityDate | 2003-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 172.