| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S180-907
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-1173
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2201-09909 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02639
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-1258
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-125
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61G5-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02532
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02422
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76838
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-288
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61G5-1051
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3205 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-288
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-208
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1333
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D1-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-13
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-04 |
| filingDate |
2006-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2007-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2007-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-100690547-B1 |
| titleOfInvention |
Forming method of thin film pattern and manufacturing method of device, electro-optical device and electronic device |
| abstract |
This invention provides the formation method of the thin film pattern which can implement | achieve thinning favorably.n n n The method for forming a thin film pattern of the present invention is a method of forming a thin film pattern by arranging a functional liquid on a substrate P. A bank for protruding a bank B along a thin film pattern on the substrate P is provided. A material disposing step of disposing a functional liquid between the forming step (S1) and the bank (B) with a liquid repelling treatment step (S3) giving liquid repellency by CF 4 plasma treatment, and the bank (B) giving liquid repellency ( It is characterized by having S4).n n n n Thin film pattern, device |
| priorityDate |
2003-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |