http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100681301-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C28-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C4-123 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-00 |
| filingDate | 2005-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2007-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100681301-B1 |
| titleOfInvention | Manufacturing method of thin film metal laminate |
| abstract | Irrespective of the kind of base material, the manufacturing method of the thin film metal laminated body which can obtain the thin film metal laminated body which has excellent adhesiveness between a thin film metal layer and a base material in a short time is provided.n n n As a manufacturing method of the thin film metal laminated body on a base material, it is characterized by including following process (1)-(3).n n n (1) step of preparing the base materialn n n (2) A step of injecting a flame of a fuel gas containing a silicon-containing compound or spraying a gaseous product of the silicon-containing compound through a heat source of 400 ° C. or higher on the substrate surface;n n n (3 ') Process of forming base layer which becomes ultraviolet curable resinn n n (3) Process of forming thin metal layer by metal ion reduction treatment, for example, silver mirror reactionn n n n Thin film metal laminate, silicon-containing compound, spray treatment, ion reduction reaction |
| priorityDate | 2004-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 85.