http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100673500-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-121 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D207-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D209-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D207-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D209-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2000-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2007-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100673500-B1 |
| titleOfInvention | N-sulfonyloxyimide compound and radiation-sensitive resin composition using the same |
| abstract | According to the present invention, it is possible to generate acid with high sensitivity and efficiency, and there is no problem of volatilization or side reaction, and thus it is possible to suppress the dark reaction during the storage of the resist, and the radiation sensitive acid generator component of the radiation sensitive chemically amplified resist. An N-sulfonyloxyimide compound useful as a compound and a positive and negative radiation-sensitive resin composition using the same are provided.n n n The present invention also provides an N-sulfonyloxyimide compound represented by the following formula (1), and a chemically amplified positive and negative radiation-sensitive resin composition containing the compound as a radiation-sensitive acid generator.n n n n n n n n n n Wherein X represents a single bond or a double bond,n n n Y and Z independently represent a hydrogen atom, or jointly form a cyclic structure,n n n R is a group represented by the following formula (2).n n n n n n n n n n n In the formula, X 1 is an organic group having an ester bond,n n n R 1 represents an alkyl group or an alkoxyl group,n n n m is an integer from 1 to 11,n n n n is an integer from 0 to 10,n n n m + n≤11 is satisfied.n n n n Chemically-amplified resists, positive radiation-sensitive resin compositions, negative radiation-sensitive resin compositions, radiation-sensitive acid generators, N-sulfonyloxyimide compounds, alkali-soluble resins. |
| priorityDate | 1999-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.