http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100664870-B1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3a17dc10b5bd6e5f0df2ce1aab3bbdce
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76877
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76873
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28
filingDate 2005-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2007-01-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0090597aa1167861e72ae75485b9308c
publicationDate 2007-01-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100664870-B1
titleOfInvention Low resistance copper wiring and forming method
abstract A low resistance copper wiring using a seam and a method of forming the same are disclosed. In the method of forming a low resistance copper wiring according to the present invention, an insulating film is formed on a substrate, and the insulating film is selectively etched to form wiring grooves. A copper layer filling the wiring groove is formed on the entire surface of the substrate under the condition that the seam is generated by the electroplating method, and then the copper layer is polished to form the wiring with the seam formed on the upper center of the copper wiring. Since the surface area is increased by intentionally forming a core inside the copper wiring to include a vacancy portion formed by the core, the resistance is reduced due to the increase in the surface area of the copper wiring in which most electrons actually move.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8319348-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100854863-B1
priorityDate 2005-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23978
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID418354341

Total number of triples: 18.