| abstract |
The resist composition comprising a mixture of a cyclic polymer having an alcohol group as the soluble group and a polymer having a carboxyl or hexafluoroalcohol group in which a hydrogen atom is substituted with an acid labile group as the base resin is a resist having improved transparency, alkali dissolution contrast and plasma etching resistance. To form a film.n n n Resist, polymer, carboxyl, hexafluoroalcohol, transparency, etching, contrast. |