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filingDate 1999-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2006-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2006-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-100647379-B1
titleOfInvention Novel photoresist monomers, copolymers thereof and photoresist compositions using the same
abstract The present invention relates to a new photoresist material that can be used in the far-ultraviolet region, and contains a polymer comprising a bis (norbornene carboxylate) or bis (norbornene dicarboxylate) compound represented by the following formula (1): The photoresist composition of the present invention not only has excellent etching resistance and heat resistance, but also can significantly improve the resolution and profile of the resist.n n n [Formula 1]n n n n n n n n Wherein A, A 'R', R ", X, m and n are as defined in the specification.
priorityDate 1999-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 32.