http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100637772-B1
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3105 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
filingDate | 2004-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2006-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2006-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-100637772-B1 |
titleOfInvention | High selectivity CPM slurry composition for semiconductor STI process |
abstract | The present invention relates to a high selectivity CMP slurry composition comprising a saccharide, and more particularly, to a high selectivity CMP slurry for a semiconductor STI process including a metal oxide, a surfactant, a sugar, a pH adjuster, a preservative, a stabilizer, and deionized water. It relates to a composition. The slurry composition of the present invention provides a high selectivity ratio of silicon oxide (SiO 2 ) removal rate to silicon nitride (SiN), can be very preferably used in a CMP process with high control characteristics, and scratches generated after polishing In order to provide excellent CMP slurry composition, the polishing quality can be excellently managed, the dishing can be suppressed, the pH is not only effective in a wide pH range, and the storage stability is excellent.n n n n Sugars, high selectivity, CMP, slurry, metal oxides, surfactants, pH adjusters, preservatives, stabilizers |
priorityDate | 2004-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 130.