| abstract |
A positive photoresist composition is provided that is suitable for LCD manufacture in which an integrated circuit and a liquid crystal display portion are formed on one substrate, which is high sensitivity and high heat resistance. This positive photoresist composition contains (A) alkali-soluble resin and (B) quinonediazide group containing compound, The said (A) component is a phenol compound (a1) represented by the following general formula (I), and the following It is a novolak resin synthesize | combined by the condensation reaction of mixed phenols and aldehydes containing the phenol compound (a2) represented by General formula (II).n n n n System LCD, Photoresist Composition, Resist Pattern |