http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100621382-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate | 2004-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2006-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2006-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100621382-B1 |
| titleOfInvention | Photosensitive resin composition and formation method of pattern using the same |
| abstract | (Problem) A protective film or an interlayer insulating film excellent in transparency, heat resistance and flatness is desired as a photosensitive resin composition which is preferably used for forming protective films or interlayer insulating films of electronic components such as liquid crystal display devices, integrated circuit devices and solid-state imaging devices. In addition, since the coating property is excellent and the developability is excellent, the photosensitive resin composition and the pattern using the same further improve the characteristic that even a large substrate can easily form a uniform film and have good storage stability. It provides a formation method.n n n (Solution) (a) Copolymer of unsaturated carboxylic acid or unsaturated carboxylic anhydride with an epoxy group-containing polymerizable unsaturated compound, (b) A polymer which essentially comprises monomer units of styrene and / or styrene derivatives and monomer units of unsaturated organic acids, (c The content ratio of the polymer of the composition ratio of the polymer of the composition (b) which deviated by 3% from the average value of the composition ratio of the polymer of (b) using at least the quinonediazide group-containing compound and (d) the organic solvent as constituents. It is made into 20 mass% or less.n n n Photosensitive Resin Composition |
| priorityDate | 2003-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 325.