http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100607792-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76838 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02063 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76814 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 |
| filingDate | 2003-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2006-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2006-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100607792-B1 |
| titleOfInvention | Manufacturing method of semiconductor device |
| abstract | The present invention relates to a method of manufacturing a semiconductor device, and in the present invention, after a series of open-hole (contact hole or via hole) forming processes, a series of open-hole cleaning processes using various inert etching gases are sequentially performed. By effectively removing the foreign substances generated previously, the deterioration of the quality of the contact plug due to the interference of the foreign substances can be suppressed in advance.n n n In addition, in the present invention, through a series of open-hole cleaning process using a variety of inert etching gas, effectively removes the foreign substances generated, thereby maintaining the quality of the contact plug in an optimal state, between each metal wiring The electrical connection quality can be improved beyond a certain level.n n n In addition, in the present invention, through a series of open-hole cleaning process using a variety of inert etching gas, by effectively removing the foreign substances generated, thereby pre-suppressing the possibility of oxidation of a specific structure by the etching chemical, Even after a series of chemical cleaning procedures have been carried out, the whole process can be managed more freely. |
| priorityDate | 2003-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 24.