http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100606630-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate | 2004-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2006-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2006-07-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100606630-B1 |
| titleOfInvention | Positive photoresist composition and method of forming resist pattern using same |
| abstract | Provided are a positive resist composition and a method of forming a resist pattern capable of realizing improved resolution, reduced LER, and reduced defect. This composition and method,n n n (A) (a1) Resin which has a structural unit derived from ((alpha) -methyl) hydroxy styrene represented by following General formula (1), and (a2) the structural unit represented by following General formula (2) (a1) A positive resist composition containing a component having a dissolution rate of 100 to 1000 mW / sec in an aqueous solution of TMAH (tetramethylammonium hydroxide) at 2.38% by mass of the component (A), and a method of forming a resist pattern using the same. to be.n n n n n n n n n n n n n (In General Formulas (1) and (2), R represents a hydrogen atom or a methyl group.) |
| priorityDate | 2003-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 173.