http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100605414-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1025 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L79-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0387 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-08 |
| filingDate | 1999-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2006-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2006-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-100605414-B1 |
| titleOfInvention | Positive type photosensitive resin precursor composition and its manufacturing method |
| abstract | The present invention comprises (a) a polymer having a structural unit represented by the structural unit represented by the formula (1) as a bond between structural units, and (b) a photoacid generator, and pattern formation is possible by light irradiation and subsequent development. The present invention relates to a positive photosensitive resin precursor composition, wherein the total carboxyl group contained in 1 g of the polymer is 0.02 mmol or more and 2.0 mmol or less, and alkali development is possible, and a high sensitivity photosensitive resin composition is provided.n n n n n n n n R 1 is a trivalent to octavalent organic group having at least two or more carbon atoms, R 2 is a divalent to hexavalent organic group having at least two or more carbon atoms, R 3 is hydrogen, or C1-20 It is an organic group. n is an integer from 3 to 100000, m is 1 or 2, p, q is an integer from 0 to 4 and at the same time p + q> 0.n n n Positive type photosensitive resin precursor composition, a manufacturing method, exposure, alkali aqueous solution, a pattern |
| priorityDate | 1998-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 23.